厂商 :北京特博万德科技有限公司
北京 北京
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商品详细描述
4“ 抛光锗片,用于外延衬底,超高质量。
n- and p-type Ge
Submitted by drupaladmin on Sat, 2008-03-01 00:25.
Semi-conducting Ge Specifications
Growth Method |
VGF |
Dopant |
n-type: As; p-type: Ga |
Wafer Shape |
Round (DIA: 2" TO 6") |
Surface Orientation** |
(100)±0.5° |
**Other Orientations maybe available upon request
Dopant |
As (n-type) |
Ga (p-type) |
Resistivity (?.cm) |
0.05-0.25 |
0.005-0.04 |
Etch Pitch Density (cm2) |
≤ 300 |
≤ 300 |
Wafer Diameter (mm) |
50.8±0.3 |
100±0.3 |
Thickness (?m) |
175±25 |
175±25 |
TTV [P/P] (?m) |
≤ 15 |
≤ 15 |
WARP (?m) |
≤ 25 |
≤ 25 |
IF* (mm) |
17±1 |
32.5±1 |
OF (mm) |
7±1 |
18±1 |
Polish** |
E/E, P/E, P/G |
E/E, P/E, P/G |
Backside Ra (?m)*** |
< 0.1 |
< 0.1 |