全自动小型线路板清洗高纯水设备

微电子、电池工业用水
Pure water for Micro-electronics, batteries industrial
应用领域和指标要求参考
Reference of applications areas and indexes required
 

用途Applications	用水指标Water Indicators	参考标准Reference standard
单晶硅、多晶硅、太阳能电池、氧化铝坩埚、光伏玻璃等生产 Monocrystalline silicon, polycrystalline silicon, solar cells, alumina crucible, photovoltaic glass, and other production	电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM	我国电子级水质技术指标，GB11446-1-1997 The water quality of Chinas electronic-grade technical indicators GB11446-1-1997 美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor
单晶硅半导体集成电路块，显像管、玻壳、液晶显示器等制造工业 Monocrystalline silicon semiconductor chips, tubes, glass, liquid crystal displays and other manufacturing industries	电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM	美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade  water quality technical specifications  GB11446-1-1997
光学材料清洗用水、电子陶瓷行业用纯水、尖端磁性材料用纯水 Pure water for optical materials, electronic ceramics and cutting-edge magnetic materials	电阻率10 ~17 MΩ.CM Resitivity10 ~17 MΩ.CM	我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade  water quality technical specifications  GB11446-1-1997 美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor
蓄电池、锂电池、锌锰电池生产 Batteries, lithium batteries, zinc-manganese battery production	电阻率5 ~10 MΩ.CM Resitivity5 ~10 MΩ.CM	我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade  water quality technical specifications  GB11446-1-1997
有色金属、贵金属冶炼用水、纳米级新材料生产用水、航空新材料生产用水、ITO导电玻璃制造用水、电子级无尘布生产用水 Pure water for non-ferrous metals, precious metals smelting, nano-scale production of new materials, aviation and production of new materials, ITO conductive glass, production of electronic-grade for dust-free cloth	电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM	我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade  water quality technical specifications  GB11446-1-1997   美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor

   
主要工艺流程和出水指标：
Main technical process and standard of output water
※预处理+反渗透+离子交换器（电阻率≥15MΩ.CM）
   Pre-treatment+ stage reverse osmosis system+ion exchange (electric conductivity≥15MΩ.CM）
※预处理+二级反渗透+EDI（电阻率≥15MΩ.CM）
   Pre-treatment+ stage reverse osmosis system+EDI (electric conductivity≥15MΩ.CM）
※    预处理+二级反渗透+脱气膜+EDI +抛光混床（电阻率≥18.25MΩ.CM）
   Pre-treatment+ double stage reverse osmosis system+air film+EDI +polishing mixed bed (electric conductivity≥18.25MΩ.CM）
 
详细工艺需根据原水设计情况进行设计
      Details of the design process should be carried out according to the feed water quality.
纯水设备的主要特点
Main technics of pure water treatment equipment

▼结合电子工业用水连续生产的特性，采用了全膜法处理工艺（UF+RO+EDI）完成高纯水的制备工作；   The electronics industry with the characteristics of continuous production of water, using the entire membrane treatment process (UF + RO + EDI) to complete the preparation of highly pure water work; ▼对于电子行业用水的特性，增强了对水中二氧化硅、重金属和有机碳的脱除； For the water features of electronics industry , enhanced to removal silica, heavy metals and organic carbon in water. ▼采用了氮封水箱解决了电子工业用水要求较高，水的储存容易污染问题； Using nitrogen sealed water tanks to solve the problems of electronics industry require a higher water use, water storage easy to pollution ; ▼采用进口反渗透膜，脱盐率高，使用寿命长，运行成本低廉，产水水质高而稳定； Adopted import reverse osmosis membranes, desalination rate is high, long service life, the operation cost is low, the output water quality is high and stable.   ▼在线水质监测控制，实时监测水质变化，保障水质安全； On-line water quality monitoring and control, real-time monitoring of water quality to ensure safety of water quality.   ▼全自动电控程序，还可选配触摸屏操作，使用方便，操作简单、安全； Automatic control procedure, also equipment with touch screen operation, easy to use, the operation is simple, safe.   ▼切合当地水质的个性化设计，设想周到的堆叠式设计，占地面积小，全方位满足需求。 Correspond with the local water personalized design, considerate stackable design, small floor area, which can meet considerate needs. ▼运行费用及维修成本低，全自动运行，实现无人化管理操作。 Operating costs and maintenance cost low, automatic operation, can realize unmanned management operations